In this interview, AZoM talks to Bas Derksema about advancements in plasma etching and deposition processes for compound semiconductor materials applications. Please could you introduce yourself and ...

Multiscale modelling and control of thin film deposition processes encompass advanced simulation techniques that integrate phenomena occurring over disparate spatial and temporal scales. At the ...

An extensive range of insulating thin films are utilized in modern VLSI circuits providing electrical isolation between conducting regions within a device and as a final capping passivation layer.

In this interview, discover how ATLANT 3D's DALP technology is revolutionizing thin-film deposition, enabling rapid prototyping and advanced material applications in nanofabrication. Can you please ...

Researchers from ten countries assessed the prospects of using vapor-based deposition processes to put perovskite thin film processing on the fast track to commercialization, drawing attention to its ...

For years, the industry has been working on an advanced technology called area-selective deposition for chip production at 5nm and beyond. Area-selective deposition, an advanced self-aligned ...

Chemical vapor deposition (CVD) is a process widely used in the manufacturing of electronic and energy devices as it is able to form conducting, semiconducting and dielectric thin films. Here, in the ...

Imagine being able to deposit a film of material just a few atomic layers at a time. As impossible as that sounds, atomic layer deposition (ALD) is a reality. In fact, it’s being used in an ...